Nanomaterials and Spectroscopy Group

CGC Class 1000 Cleanroom Equipment

Plasma-Enhanced Chemical Vapour Deposition system (PE-CVD)

Model: Vision 310, Advanced Vacuum AB

Used for plasma-enhanced chemical vapour deposition system is used for depositing amorphous Si, SiO₂ and Si₃N₄.

Gases connected: SiH₄, NH₃, N₂O, N₂

Users in charge:

• Dr Yury Alaverdyan

Reactive Ion Etcher (RIE)

Model: Vision 320, Advanced Vacuum AB

Used for reactive-ion etching of Si, SiO₂ and Si₃N₄. Gases connected: SF₆, CHF₃, C₄F₈, CF₄, O₂, Ar, N₂.Compatible only with the following substrate/mask materials: Si, Al, PR, SiO₂, Si₃N₄ (exposed noble metal parts/masks are not allowed).

Users in charge:

• Dr Gyeong Cheol Park

Inductively-Coupled Reactive Ion Etcher (ICP-RIE) "APEX"

Model: APEX SLR, Advanced Vacuum AB

A load-locked system for inductively-coupled reactive-ion etching of Si, SiO₂ and Si₃N₄ with an enhanced rate and anisotropicity. Gases connected: SF₆, CHF₃, C₄F₈, CF₄, O₂, Ar, N₂ Compatible only with the following substrate/mask materials: Si, Al, PR, SiO₂, Si₃N₄ (exposed noble metal parts/masks are not allowed).

Users in charge:

• Dr Gyeong Cheol Park

Inductively-Coupled Reactive Ion Etcher (ICP-RIE) "Oxford"

Model: PlasmaLab 100, Oxford Instruments

A load-locked system for inductively-coupled reactive-ion etching of Si, SiO₂ and Si₃N₄ with an enhanced rate and anisotropicity. Gases connected: SF₆, CHF₃, C₄F₈, CF₄, O₂, Ar, N₂ Compatible only with the following substrate/mask materials: Si, Al, PR, SiO₂, Si₃N₄ (exposed noble metal parts/masks are not allowed).

Users in charge:

• Dr Yury Alaverdyan

Reactive Ion Etcher "NanoEtch"

Model: NanoEtch, Moorfield Nanotechnology Ltd

The tool implements a unique soft-etching technology and provides the fine etching control crucial for graphene and 2D materials research in a convenient, benchtop package. Gases connected: CF₄, O₂, Ar, N₂.

Users in charge:

• Dr Alisson Cadore

Plasma Cleaner "Femto"

Model: Femto, Diener Electronics GmbH.

This is a low-pressure plasma system used for plasma cleaning of substrates and activating surfaces. Gases connected: O₂, N₂.

Users in charge:

• Dr Yury Alaverdyan

Electron-Beam Evaporator/Sputterer

Model: PVD 200 Pro, Kurt J. Lesker

This PVD tool is used for e-beam evaporation and sputter deposition of metals dielectrics. Materials: Au, Ag, Cu, Cr, Ti, Al, Ni, Sn, Mo, ITO, SiO₂, Al₂O₃.

Users in charge:

• Mr Guiseppe Russo

Thermal Evaporator

Model: MiniLab 60, Moorfield Nanotechnology Ltd

Features: Manual and Automatic process modes, HMI, used for a thermal evaporation of selected metals. Materials: Au, Ag, Cr, Al.

Users in charge:

• Ms Hannah Watson
• Dr Wenshan Li

Atomic Layer Deposition (ALD)

Model: TFS200, Beneq

Used for Atomic Layer Deposition of Al₂O₃ and TiO₂. Materials: liquid TMA and TiCl₄ precursors.

Users in charge:

• Mr Yang Li

Ar-filled Glovebox

Model: M-Braun

Inert-atmosphere (Ar) glovebox with a robotized 3D graphene transfer system and a thermal evaporator. The thermal evaporator can be accessed from the inside as well as outside of the glovebox. There is a spinner and a hotplate inside.

Users in charge:

• Dr Alisson Cadore
• Dr Ioannis Paradeisanos

Transition-Metal Dichalcogenides Chemical Vapour Deposition system (TM-CVD)

Model: Planartech

A dual-furnace Chemical Vapour Deposition system for growth of 2D materials.

Users in charge:

• Dr Osman Balci

Plasma-Enhanced Graphene Chemical Deposition system (PE-G-CVD)

Model: Planartech

Plasma-Enhanced Chemical Vapour Deposition system for growth of high-quality graphene.

Users in charge:

• Dr Osman Balci

Graphene Transfer Systems x2

The tool is equipped with micro-manipulators and is based on Nikon Eclipse microscope.

Users in charge:

• Dr Alisson Cadore
• Dr Ioannis Paradeisanos

1k-MTI-furnace

Model: MTI GTF-1200X

Users in charge:

• Dr Anna Ott
• Dr Yury Alaverdyan

Acid Bench

This wetbench is used for graphene transfer, cleaning, and a number of other processes involving acids.

Solvent Bench

This wetbench is used for cleaning, preparation of samples for deposition, etching, as well as any other operations requiring solvents.