Facilities

The University of Cambridge Electrical Engineering Division building opened in 2006 and houses custom-built state-of-the-art photonics and electronics research and prototype development facilities across approx. 5,000m2 of lab space, including class 100 (140 m2), class 1000 (140 m2) and class 10k (160 m2) clean room facilities.


Available equipment includes:


Specialist deposition systems:

Cold- and hot-walled, thermal and plasma enhanced CVD reactors for the growth of graphene and carbon nanotubes (9 different reactors ranging from high vacuum to atmospheric pressure)

Cold- and hot-walled CVD reactors for the growth of semiconducting nanowires

ECWR plasma and Filtered Cathodic Arc deposition systems for the deposition of amorphous carbon films

Thermal and plasma enhanced CVD reactors for the deposition of amorphous Si thin films

Plasma enhanced and thermal Atomic Layer Deposition (ALD) reactors

Remote plasma and ion beam sputterer for the deposition of functional oxide thin films

Thermal and e-beam evaporators

Magnetron, RF and DC sputterers


Device processing facilities:

Optical Mask Aligners

E-beam Lithography

Reactive Ion etching (RIE and DRIE) systems

Acid and Solvent Bays

Annealing and oxidation furnaces

Wire and Device bonders

Inkjet Printer

Ultra-centrifuges and Sonicators

Langmuir-Blodgett equipment


Characterisation and Testing facilities:

Surface and optical profilometers

UV-Vis and FTIR spectrometers

Raman spectroscopy and PL systems

Ellipsometry systems

A range of Electrical Probe stations

Atomic Force (AFM), Optical and Electron (SEM, TEM shared with Physical Sciences) Microscopes